Thin films, coatings and applications
Course Name:
Thin films, coatings and applications (MT417)
Programme:
Semester:
Category:
Credits (L-T-P):
Course Outcomes:
CO1: A complete understanding of thin film growth kinetics in physical vapour deposition. Basic principles of different vapour deposition techniques
CO2: Methodology of solution processed coating
CO3: Physical and microstructural properties of thin films/coatings
CO4: Processes and properties of hard coatings for metallurgical applications. Thin films devices
Course modules and teaching hours:
MODULE I (15 hours): Need for miniaturization, Basics of thin film, Brief review of kinetic theory of adsorption, desorption, film growth: nucleation and growth kinetics. Vacuum science and technology, vacuum pumps, surface: role of substrate surface, substrate cleaning. Epitaxy, thin film growth control, physical vapor deposition (PVD) processes, evaporation: thermal and e-beam. Principles of glow discharge and various sputtering processes. Fundamentals of Chemical Vapor Deposition (CVD) processes. Pulsed laser deposition (PLD)
MODULE II (8 hours): Other techniques: electro-deposition, spin coating, sol-gel, Langmuir Blodgett (LB) techniques, SILAR technique, Doctor blade technique, printing
MODULE III (5 hours): Basic thin film thickness measurement, microstructural characterization of films/coating
MODULE IV (10 hours): Hard coating: physical, mechanical and protective properties, Applications: high hardness, corrosion resistance, biocompatibility and high temperature stability. Thin film devices: optoelectronic devices, photo-detectors, solar cells